• Machine Learning-Based Modelling in Atomic Layer Deposition Processes

Machine Learning-Based Modelling in Atomic Layer Deposition Processes

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Overview

This book describes the application of machine learning modelling approaches in atomic layer deposition and presents detailed information on modelling, optimization, and prediction of the behaviour and characteristics of ALD for improved process quality control.

Product Details

ISBN-13: 9781032386737
ISBN-10: 1032386738
Publisher: CRC Press LLC
Publication date: 2025-05-06
Edition description: 1
Pages: 354
Author: Oluwatobi Adeleke, Sina Karimzadeh, Tien-Chien Jen
Language: en

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