This is the premier world conference for the presentation of the latest advances in ion implantation, from the fundamentals of ion-solid interactions to manufacturing implant equipment. All papers were peer-reviewed. Ion implantation is used to manufacture semiconductor devices. Materials properties are changed by bombarding wafers with atoms, which are accelerated in an ion implanter.
| ISBN-13: | 9780735403659 |
| ISBN-10: | 0735403651 |
| Publisher: | American Inst. of Physics |
| Publication date: | 2006-12-04 |
| Edition description: | 2006 |
| Pages: | 664 |
| Product dimensions: | Height: 8.68 Inches, Length: 11.03 Inches, Weight: 3.95068373504 Pounds, Width: 1.61 Inches |
| Author: | Karen J. Kirkby, Russell Gwilliam, Andy Smith, David Chivers |
| Language: | en |
| Binding: | Hardcover |
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