• Ion Impantation Technology 16th International Conference on Ion Implantation Technology; IIT 2006

Ion Impantation Technology 16th International Conference on Ion Implantation Technology; IIT 2006

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Est. Date: Jan 4, 2026

This is the premier world conference for the presentation of the latest advances in ion implantation, from the fundamentals of ion-solid interactions to manufacturing implant equipment. All papers were peer-reviewed. Ion implantation is used to manufacture semiconductor devices. Materials properties are changed by bombarding wafers with atoms, which are accelerated in an ion implanter.

  • Author(s): Karen J. Kirkby, Russell Gwilliam, Andy Smith, David Chivers
  • Publisher: American Inst. of Physics
  • Language: en
  • Pages: 664
  • Binding: Hardcover
  • Edition: 2006
  • Published: 2006-12-04
  • Dimensions: Height: 8.68 Inches, Length: 11.03 Inches, Weight: 3.95068373504 Pounds, Width: 1.61 Inches
  • Estimated Delivery: Jan 4, 2026
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